SCOPUS 정보 검색 플랫폼

Volumn 25, Issue 24, 2009, Pages 175-184

Extreme ultraviolet interference lithography for generation of platinum nanoparticles on glassy carbon

(9) Savouchkina, A a Foelske Schmitz, A a Kotz R a Wokaun, A a Scherer, G G a Padeste, C a Ziegler, J a Auzelyte, V a Solak, H H a

a PAUL SCHERRER INSTITUTE (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CORROSION; GLASS; GLASSY CARBON; LIGHT SOURCES; NANODOTS; NANOLITHOGRAPHY; PHOTORESISTS; PLATINUM; PROTON EXCHANGE MEMBRANE FUEL CELLS (PEMFC); SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

EXPOSURE PARAMETERS; EXTREME ULTRAVIOLET INTERFERENCE LITHOGRAPHIES; PLATINUM DEPOSITIONS; PLATINUM NANO-PARTICLES; POLYMER ELECTROLYTE FUEL CELLS; SWISS LIGHT SOURCES; THERMAL PRE-TREATMENT; X-RAY INTERFERENCE LITHOGRAPHIES;

POLYELECTROLYTES;

EID: 79952746994 PISSN: 19385862 EISSN: 19386737 Source Type: Conference Proceeding
DOI: 10.1149/1.3316124 Document Type: Conference Paper

Times cited : (4)

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