Hardness of nanocrystalline TiO2 thin films doped with terbium

Proceedings of 2010 International Students and Young Scientists Workshop "Photonics and Microsystems", STYSW 2010

Volumn , Issue , 2010, Pages 86-88

  Wojcieszak, Damian ^a   Kaczmarek, Danuta ^a   Domaradzki, Jaroslaw ^a   Prociow, Eugeniusz ^a   Placido, Frank ^b   Lapp, Steffen ^b   Mazur, Michal ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b UNIVERSITY OF THE WEST OF SCOTLAND   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE STRUCTURES; HIGH ENERGY; MATRIX; NANOCRYSTALLINE MATRIX; NANOCRYSTALLINE TIO; REACTIVE MAGNETRON SPUTTERING; RUTILE STRUCTURE; TIO;

CRYSTALLITE SIZE; HARDNESS; MICROSYSTEMS; OXIDE MINERALS; TERBIUM; THIN FILMS; TITANIUM DIOXIDE; VAPOR DEPOSITION;

SEMICONDUCTOR DOPING;

EID: 79952740854     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/STYSW.2010.5714178     Document Type: Conference Paper

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