Surface preparation of ZnO single-crystal substrate for the epitaxial growth of ZnO thin films

Journal of Crystal Growth

Volumn 318, Issue 1, 2011, Pages 516-518

  Nakamura, T ^a   Masuko, K ^a   Ashida, A ^a   Yoshimura, T ^a   Fujimura, N ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

A1. Atomic force microscopy; A1. Etching; A1. Substrates; B1. Oxides; B1. Zinc compounds; B2. Semiconducting IIVI materials

Indexed keywords

A1. ATOMIC FORCE MICROSCOPY; A1. ETCHING; A1. SUBSTRATES; B1. OXIDES; B1. ZINC COMPOUNDS; SEMICONDUCTING II-VI MATERIALS;

ATOMIC FORCE MICROSCOPY; EPITAXIAL FILMS; EPITAXIAL GROWTH; FILM PREPARATION; METALLIC FILMS; OPTICAL FILMS; SEMICONDUCTOR GROWTH; SUBSTRATES; SURFACE TREATMENT; TRANSITION METAL COMPOUNDS; ZINC; ZINC OXIDE;

WET ETCHING;

EID: 79952739292     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2010.10.044     Document Type: Conference Paper

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