Effects of oxygen addition on electrochromic properties in low temperature plasma-enhanced chemical vapor deposition-synthesized MoOxC y thin films for flexible electrochromic devices

Thin Solid Films

Volumn 519, Issue 11, 2011, Pages 3875-3882

  Lin, Yung Sen ^a   Lai, Jhen Yi ^a   Tsai, Tsung Hsien ^a   Chuang, Pei Ying ^a   Chen, Yen Cheng ^a  

^a FENG CHIA UNIVERSITY   (Taiwan)

Author keywords

Cyclic Voltammetry; Electrochromic Materials; Flexible Substrate; Molybdenum Oxide; Plasma Enhanced Chemical Vapor Deposition

Indexed keywords

ARGON GAS; COLORATION EFFICIENCIES; DEINTERCALATION; ELECTROCHROMIC MATERIALS; ELECTROCHROMIC PERFORMANCE; ELECTROCHROMIC PROPERTIES; ELECTROCHROMICS; FLEXIBLE ELECTROCHROMIC DEVICE; FLEXIBLE SUBSTRATE; ION DIFFUSION COEFFICIENT; LOW TEMPERATURE PLASMAS; MODIFIED SURFACES; MOLYBDENUM CARBONYL; MORPHOLOGY AND COMPOSITION; OXIDE SUBSTRATES; OXYGEN ADDITION; OXYGEN CONTENT; OXYGEN GAS; POROUS SURFACE; RADIO FREQUENCY POWER; ROOM TEMPERATURE; SCAN RATES; SURFACE COMPOSITIONS;

ARGON; CYCLIC VOLTAMMETRY; ELECTROCHROMIC DEVICES; ELECTROCHROMISM; INTERCALATION; MOLYBDENUM; MOLYBDENUM OXIDE; OXIDE FILMS; OXYGEN; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; POLYETHYLENE TEREPHTHALATES; SUBSTRATES; SURFACE MORPHOLOGY; SURFACES; THIN FILMS; TIN; TIN OXIDES;

VAPOR DEPOSITION;

EID: 79952734777     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.02.011     Document Type: Article

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