Crystallization of chemically vapor deposited molybdenum and mixed tungsten/molybdenum oxide films for electrochromic application

Thin Solid Films

Volumn 515, Issue 11, 2007, Pages 4609-4613

  Gesheva, K A ^a   Cziraki, A ^b   Ivanova, T ^a   Szekeres, A ^c  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^b EÖTVÖS LORÁND UNIVERSITY   (Hungary)

^c INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

Author keywords

Chemical vapor deposition; Crystallization; Electrochromic effect; Metal oxide films; X ray diffraction

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; CRYSTALLIZATION; GLASS; MOLYBDENUM COMPOUNDS; PARAMETER ESTIMATION; PYROLYSIS; SILICON; SUBSTRATES; THIN FILMS; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION;

ELECTROCHROMIC EFFECT; METAL OXIDE FILMS; MOLYBDENUM OXIDE FILMS; TRICLINIC CRYSTALLINE PHASE;

ELECTROCHROMISM;

EID: 33847119507     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.042     Document Type: Article

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