Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition

Thin Solid Films

Volumn 446, Issue 2, 2004, Pages 167-171

  Hamelmann, F ^a   Brechling, A ^a   Aschentrup, A ^a   Heinzmann, U ^a   Jutzi, P ^a   Sandrock, J ^b   Siemeling, U ^b   Ivanova, T ^c   Szekeres, A ^d   Gesheva, K ^c  

^a BIELEFELD UNIVERSITY   (Germany)

^b UNIVERSITY OF KASSEL   (Germany)

^c CTRL LAB SOLAR ENER NEW ENER S   (Bulgaria)

^d INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

Author keywords

Chemical vapor deposition; Electrochromic films; Molybdenum oxide; Plasma processing and deposition

Indexed keywords

AMORPHOUS MATERIALS; AUGER ELECTRON SPECTROSCOPY; CARBON; CHEMICAL SENSORS; CONTAMINATION; ELECTROCHROMIC DEVICES; ELECTRON TRANSITIONS; ELLIPSOMETRY; EXTRAPOLATION; FILM GROWTH; LIGHT ABSORPTION; MOLYBDENUM COMPOUNDS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS;

ELECTROCHROMIC FILMS; VOLATILITY;

THIN FILMS;

EID: 0346750526     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.09.045     Document Type: Article

References (17)

1. Granqvist C.G. Handbook of Inorganic Electrochromic Materials. 1995;Elsevier, Amsterdam.
2. Monk P.M.S., Mortimer R.J., Rosseinsky D.R. Electrochromism: Fundamentals and Applications. 1995;VCH, Weinheim.
3. Solis J.L., Saukko S., Kish L., Granqvist C.G., Lantto V. Thin Solid Films. 391:2001;255.
4. Ivanova T., Gesheva K.A., Szekeres A., Maksimov A., Zaitzev S. J. Phys. IV France. 11:2001;1023.
5. Davazoglou D., Donnadieu A. J. Appl. Phys. 147:1987;131.
6. Szekeres A., Gogova D., Gesheva K. J. Crystal Growth. 198/199:1999;1235.
7. Kodas T., Hampden-Smith M. The Chemistry of Metal CVD. 1994;VCH, Weinheim.
8. Hamelmann F., Klipp A., Haindl G., Schmalhorst J., Majkova E., Kleineberg U., Jutzi P., Heinzmann U. Thin Solid Films. 358:2000;90.
9. Gordon R.G., Barry S., Barton J.T., Broomhall Dillard R.N.R. Thin Solid Films. 392:2001;231.
10. Weiss F., Lindner J., Senateur J.P., Durbourdieu C., Galindo V., Audier M., Abrutis A., Rosina M., Fröhlich K., Haessler W., Oswald S., Figueras A., Santiso J. Surf. Coat. Technol. 133/134:2000;191.
11. Barbee T.W. Proc. SPIE. 563:1985;2.
12. Hamelmann F., Aschentrup A., Schmalhorst J., Kleineberg U., Heinzmann U., Dittmar K., Jutzi P. J. Phys. IV France. 11:2001;431.
13. Ashrit P.V., Bader G., Truong V.-V. Thin Solid Films. 320:1998;324.
14. Miyata N., Akiyshi S. J. Appl. Phys. 58:1985;1651.
15. Abdellaoui A., Leveque G., Donnadieu A., Bath A., Bouchikhi B. Thin Solid Films. 304:1997;39.
16. Julien C., Khelfa A., Hussain O.M., Nazri G.A. J. Crystal Growth. 156:1995;235.
17. Granqvist C.G. Solar Energy Mater. Solar Cells. 60:2000;201.