Fabrication and characterization of vacuum deposited fluorescein thin films

Thin Solid Films

Volumn 519, Issue 11, 2011, Pages 3835-3839

  Jalkanen, Pasi ^a   Kulju, Sampo ^a   Arutyunov, Konstantin ^a   Antila, Liisa ^a   Myllyperkiö, Pasi ^a   Ihalainen, Teemu ^a   Kääriäinen, Tommi ^b   Kääriäinen, Marja Leena ^b   Korppi Tommola, Jouko ^a  

^a UNIVERSITY OF JYVÄSKYLÄ   (Finland)

^b LAPPEENRANTA UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

Absorption; Aggregation; Emission; Fluorescein; Molecules; Thin films; Vacuum deposition

Indexed keywords

ABSORPTION AND EMISSION SPECTRA; AGGREGATION; ANATASE TIO; COATED GLASS; ELECTRON TRANSFER; EMISSION; EMISSION SPECTRUMS; FLUORESCEIN; NANO SCALE; NANOCRYSTALLINES; NANOFABRICATION; RED-SHIFTED; SEMICONDUCTOR CONDUCTION; SMOOTH GLASS; SOLID SURFACE; SOLVENT FREE; SURFACE TOPOLOGY; TIO; UNIFORM LAYER; VACUUM EVAPORATION TECHNIQUE;

ABSORPTION; DEPOSITION; ELECTRON MOBILITY; EMISSION SPECTROSCOPY; ETHANOL; FLUORINE; GLASS; LIGHT ABSORPTION; MONOLAYERS; OPTOELECTRONIC DEVICES; OXIDE FILMS; SURFACES; THIN FILMS; TIN; TITANIUM DIOXIDE; VACUUM; VACUUM DEPOSITION; VAPOR DEPOSITION;

VACUUM EVAPORATION;

EID: 79952734651     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.01.238     Document Type: Article

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