Influence of deposition parameters and heat treatment on the NO2 sensing properties of nanostructured indium tin oxide thin film

Thin Solid Films

Volumn 519, Issue 10, 2011, Pages 3378-3382

  Vijayalakshmi, K ^a   Ravidhas, C ^a   Pillay, V Vasanthi ^b   Gopalakrishna, D ^a  

^a BISHOP HEBER COLLEGE   (India)

^b J J COLLEGE OF ARTS AND SCIENCE   (India)

Author keywords

Annealing; Gas sensors; Indium tin oxide; Nanostructures; Nitrogen Dioxide; Sputtering; Thin films

Indexed keywords

CRYSTALLINITIES; DEPOSITION PARAMETERS; DOUBLE-BEAM; ELECTRICAL ANALYSIS; ELECTRICAL RESISTIVITY; FOUR-PROBE; GAS SENSORS; GLASS SUBSTRATES; HIGH SENSITIVITY; INDIUM TIN OXIDE; INDIUM TIN OXIDE FILMS; INDIUM TIN OXIDE THIN FILMS; ITO FILMS; NANO-STRUCTURED; NITROGEN DIOXIDE; OPTICAL TRANSMITTANCE; OXYGEN PARTIAL PRESSURE; RADIO FREQUENCY MAGNETRON SPUTTERING; SENSING PROPERTY; SPUTTERING POWER; STRUCTURAL CHARACTERIZATION; SURFACE AREA; VISIBLE REGION; WORKING TEMPERATURES;

ANNEALING; CHEMICAL SENSORS; ELECTRIC CONDUCTIVITY; GAS DETECTORS; HALL EFFECT; INDIUM; INDIUM COMPOUNDS; ITO GLASS; MAGNETIC FIELD EFFECTS; NANOSTRUCTURES; NITROGEN; NITROGEN OXIDES; OXIDE FILMS; OXYGEN; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; TIN; TIN DIOXIDE; TIN OXIDES; VAPOR DEPOSITION; X RAY DIFFRACTION;

AMORPHOUS FILMS;

EID: 79952316332     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.12.164     Document Type: Article

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