Synthesis of niobium oxide nanowires using an atmospheric pressure plasma jet

Thin Solid Films

Volumn 519, Issue 10, 2011, Pages 3043-3049

  Lin, Yun ^a   Yang, Yao Jhen ^a   Hsu, Cheng Che ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

Atmospheric pressure plasma; Metal oxide; Nanowire; Niobium oxide

Indexed keywords

ATMOSPHERIC PRESSURE PLASMA JETS; ATMOSPHERIC PRESSURE PLASMAS; HIGH GROWTH RATE; METAL OXIDE; NIOBIUM FOILS; PARAMETRIC STUDY; PULSE POWER; RAPID SYNTHESIS; SYNERGETIC EFFECT;

ATMOSPHERIC PRESSURE; ATMOSPHERICS; DC POWER TRANSMISSION; METALLIC COMPOUNDS; NANOWIRES; NIOBIUM; OXYGEN; PLASMA ACCELERATORS; PLASMA JETS; PLASMA SOURCES; STRUCTURAL ANALYSIS;

NIOBIUM OXIDE;

EID: 79952310757     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.12.024     Document Type: Article

References (40)

1. F. Hernandez-Ramirez, J.D. Prades, A. Tarancon, S. Barth, O. Casals, R. Jimenez-Diaz, E. Pellicer, J. Rodriguez, M.A. Juli, A. Romano-Rodriguez, J.R. Morante, S. Mathur, A. Helwig, J. Spannhake, and G. Mueller Nanotechnology 18 2007 5
2. C.C. Wu, Y.J. Zhuo, P.N. Zhu, B. Chi, J. Pu, and J. Li J. Inorg. Mater. 24 2009 897
3. B. Varghese, S.C. Haur, and C.T. Lim J. Phys. Chem. C 112 2008 10008
4. V.P. Godbole, Y.S. Kim, G.S. Kim, M.A. Dar, and H.S. Shin Electrochim. Acta 52 2006 1781
5. U. Cvelbar, Z.Q. Chen, M.K. Sunkara, and M. Mozetic Small 4 2008 1610
6. X.H. Zhang, S.Y. Xie, Z.Y. Jiang, X. Zhang, Z.Q. Tian, Z.X. Xie, R.B. Huang, and L.S. Zheng J. Phys. Chem. B 107 2003 10114
7. I. Zardo, S. Conesa-Boj, S. Estrade, L. Yu, F. Peiro, P.R.I. Cabarrocas, J.R. Morante, J. Arbiol, and A.F.I. Morral Appl. Phys. Mater. Sci. Process. 100 2010 287
8. D. Bekermann, A. Gasparotto, D. Barreca, A. Devi, R.A. Fischer, M. Kete, U.L. Stangar, O.I. Lebedev, C. Maccato, E. Tondello, and G. Van Tendeloo Chemphyschem 11 2010 2337
9. Y.-T. Hsieh, S.-H. Hsueh, U.-S. Chen, M.-W. Huang, and H.C. Shih J. Electrochem. Soc. 157 2010 K183
10. K. Ostrikov, I. Levchenko, U. Cvelbar, M. Sunkara, M. Mozetic, Nanoscale 2 (2010) 2012.
11. J. Zheng, R. Yang, L. Xie, J.L. Qu, Y. Liu, and X.G. Li Adv. Mater. 22 2010 1451
12. Y.C. Hong, J.H. Kim, C.U. Bang, and H.S. Uhm Phys. Plasmas 12 2005 4
13. S.C. Liao, H.F. Lin, S.W. Hung, and C.T. Hu J. Vac. Sci. Technol., B 24 2006 1322
14. V. Kumar, J.H. Kim, C. Pendyala, B. Chernomordik, and M.K. Sunkara J. Phys. Chem. C 112 2008 17750
15. M. Zumer, V. Nemanic, B. Zajec, M. Remskar, A. Mrzel, and D. Mihailovic Appl. Phys. Lett. 84 2004 3615
16. A.G.S. Prado, L.B. Bolzon, C.P. Pedroso, A.O. Moura, and L.L. Costa Appl. Catal., B Environ. 82 2008 219
17. J.H. Lim, and J. Choi J. Ind. Eng. Chem. 15 2009 860
18. M. Mozetic, U. Cvelbar, M.K. Sunkara, and S. Vaddiraju Adv. Mater. 17 2005 2138
19. X.D. Zhu, F. Arefi-Khonsari, C. Petit-Etienne, and M. Tatoulian Plasma Process. Polym. 2 2005 407
20. Y.W. Hsu, Y.J. Yang, C.Y. Wu, and C.C. Hsu Plasma Chem. Plasma Process. 30 2010 363
21. C.C. Hsu, C.Y. Wu, C.W. Chen, and W.C. Cheng Jpn. J. Appl. Phys. 48 2009 5
22. W.B. Hu, Y.M. Zhao, Z.L. Liu, and Y.Q. Zhu Nanotechnology 18 2007 5
23. N. Pinna, M. Antonietti, and M. Niederberger Colloid Surf. Physicochem. Eng. Asp. 250 2004 211
24. C.C. Hsu, M.J. Titus, and D.B. Graves J. Vac. Sci. Technol., A 25 2007 607
25. M.J. Titus, C.C. Hsu, and D.B. Graves J. Vac. Sci. Technol., A 28 2009 139
26. U. Cvelbar, K. Ostrikov, A. Drenik, and M. Mozetic Appl. Phys. Lett. 92 2008
27. U. Cvelbar, and M. Mozetic J. Phys. D Appl. Phys. 40 2007 2300
28. D. Haase, S. Hampel, A. Leonhardt, J. Thomas, N. Mattern, and B. Buchner Surf. Coat. Technol. 2007 9184
29. P.A. Buffat Thin Solid Films 32 1976 283
30. M. Dippel, A. Maier, V. Gimple, H. Wider, W.E. Evenson, R.L. Rasera, and G. Schatz Phys. Rev. Lett. 87 2001 095505
31. I. Levchenko, K. Ostrikov, D. Mariotti, and A.B. Murphy J. Appl. Phys. 104 2008 8
32. S. Rackauskas, A.G. Nasibulin, H. Jiang, Y. Tian, V.I. Kleshch, J. Sainio, E.D. Obraztsova, S.N. Bokova, A.N. Obraztsov, and E.I. Kauppinen Nanotechnology 20 2009 8
33. Y.Y. Fu, R.M. Wang, J. Xu, J. Chen, Y. Yan, A. Narlikar, and H. Zhang Chem. Phys. Lett. 379 2003 373
34. F. Holtzberg, A. Reisman, M. Berry, and M. Berkenblit J. Am. Chem. Soc. 79 1957 2039
35. D.W. Bridges, and W.M. Fassell J. Electrochem. Soc. 103 1956 326
36. G. Brauer, H. Muller, and G. Kuhner J. Less-Common Met. 4 1962 533
37. P. Kofstad R.T. Foley, N. Hackerman, C.V. King, F.L. LaQue, H.H. Uhlig, 1966 John Wiley & Sons, Inc New york 209
38. I. Nowak, and M. Ziolek Chem. Rev. 99 1999 3603
39. J.M. Jehng, and I.E. Wachs Chem. Mater. 3 1991 100
40. A. Schutze, J.Y. Jeong, S.E. Babayan, J. Park, G.S. Selwyn, and R.F. Hicks IEEE Trans. Plasma Sci. 26 1998 1685