Deposition of WO3 doped amorphous hydrogenated carbon film by using liquid phase electrodeposition technique and its mechanical properties

Solid State Sciences

Volumn 13, Issue 3, 2011, Pages 653-657

  Huang, Deming ^a,b   Wang, Liping ^a   Xue, Qunji ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Doped; Electrodeposition; Electrolysis; Mechanical properties; WO3 a C:H composite films

Indexed keywords

A-C:H FILMS; AMORPHOUS CARBON MATRIX; AMORPHOUS HYDROGENATED CARBON; AMORPHOUS HYDROGENATED CARBON FILMS; AS-DEPOSITED FILMS; CARBON CONTENT; DOPED; ELASTIC RECOVERY; ELECTROCHEMICAL DEPOSITION; GRAIN SIZE; GROWTH MECHANISMS; LIQUID PHASE ELECTRODEPOSITION; NANOCRYSTALLINES; SILICON SUBSTRATES; TUNGSTEN TRIOXIDE; WO3/A-C:H COMPOSITE FILMS;

AMORPHOUS CARBON; AMORPHOUS FILMS; ATMOSPHERIC PRESSURE; CARBON FILMS; DOPING (ADDITIVES); ELECTROCHEMISTRY; ELECTRODEPOSITION; ELECTROLYSIS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; HYDROGENATION; MECHANICAL PROPERTIES; RAMAN SPECTROSCOPY; REDUCTION; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN; X RAY PHOTOELECTRON SPECTROSCOPY;

COMPOSITE FILMS;

EID: 79952039356     PISSN: 12932558     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solidstatesciences.2010.12.012     Document Type: Article

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