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Volumn , Issue , 2010, Pages 571-575
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Integration of carrierless ultrathin wafers into a TSV process flow
a
Fraunhofer IZM
*
(Singapore)
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Author keywords
[No Author keywords available]
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Indexed keywords
CARRIER WAFERS;
CARRIER-LESS;
LITHOGRAPHY PROCESS;
PROCESS FLOWS;
STANDARD EQUIPMENTS;
STATE OF THE ART;
THROUGH-SILICON-VIA;
ULTRA-THIN;
ULTRATHIN SILICON;
BONDING;
ELECTRONICS PACKAGING;
LITHOGRAPHY;
MECHANICAL STABILITY;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON WAFERS;
WAFER BONDING;
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EID: 79951917753
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/EPTC.2010.5702703 Document Type: Conference Paper |
Times cited : (4)
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References (10)
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