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Volumn , Issue , 2010, Pages 571-575

Integration of carrierless ultrathin wafers into a TSV process flow

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER WAFERS; CARRIER-LESS; LITHOGRAPHY PROCESS; PROCESS FLOWS; STANDARD EQUIPMENTS; STATE OF THE ART; THROUGH-SILICON-VIA; ULTRA-THIN; ULTRATHIN SILICON;

EID: 79951917753     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/EPTC.2010.5702703     Document Type: Conference Paper
Times cited : (4)

References (10)
  • 1
    • 77955220471 scopus 로고    scopus 로고
    • Evaluation of Thin Wafer Processing using a Temporary Wafer Handling System as Key Technology for 3D System Integration
    • Zoschke, K. et al: "Evaluation of Thin Wafer Processing using a Temporary Wafer Handling System as Key Technology for 3D System Integration," Proc 60th Electronic Components and Technology Conf, Las Vegas, June 2010 , pp. 1386-1392.
    • Proc 60th Electronic Components and Technology Conf, Las Vegas, June 2010 , pp. 1386-1392
    • Zoschke, K.1
  • 6
    • 77955182534 scopus 로고    scopus 로고
    • Semiconductor Wafer and Producing the Same
    • WO 2009/141811 A2
    • Spiller, S. M. et al, "Semiconductor Wafer and Producing the Same". WO 2009/141811 A2
    • Spiller, S.M.1
  • 7
    • 77955182534 scopus 로고    scopus 로고
    • Semiconductor Wafer and Producing the Same
    • WO 2009/141740 A2
    • Spiller, S. M. et al, "Semiconductor Wafer and Producing the Same". WO 2009/141740 A2.
    • Spiller, S.M.1
  • 8
    • 79951881045 scopus 로고    scopus 로고
    • Modified Mask for Photolithography of a Wafer with Recess
    • PCT/IB2010/053612.
    • Spiller, S. M. et al, "Modified Mask for Photolithography of a Wafer with Recess" . PCT/IB2010/053612.
    • Spiller, S.M.1
  • 10
    • 77955207961 scopus 로고    scopus 로고
    • Wafer Grinding Method
    • US 2008/0090505 A1
    • Yoshida et al, "Wafer Grinding Method". US 2008/0090505 A1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.