-
1
-
-
9744248669
-
Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
-
DOI 10.1038/nature03090
-
K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, Nature (London), 432, 488 (2004) 10.1038/nature03090 (Pubitemid 39585210)
-
(2004)
Nature
, vol.432
, Issue.7016
, pp. 488-492
-
-
Nomura, K.1
Ohta, H.2
Takagi, A.3
Kamiya, T.4
Hirano, M.5
Hosono, H.6
-
2
-
-
34548684568
-
High performance thin film transistors with cosputtered amorphous indium gallium zinc oxide channel
-
DOI 10.1063/1.2783961
-
J. K. Jeong, J. H. Jeong, H. W. Yang, J. S. Park, Y. G. Mo, and H. D. Kim, Appl. Phys. Lett., 91, 113505 (2007). 10.1063/1.2783961 (Pubitemid 47416041)
-
(2007)
Applied Physics Letters
, vol.91
, Issue.11
, pp. 113505
-
-
Jeong, J.K.1
Jeong, J.H.2
Yang, H.W.3
Park, J.-S.4
Mo, Y.-G.5
Kim, H.D.6
-
3
-
-
34249697083
-
High mobility bottom gate InGaZnO thin film transistors with Si Ox etch stopper
-
DOI 10.1063/1.2742790
-
M. Kim, J. H. Jeong, H. J. Lee, T. K. Ahn, H. S. Shin, J. S. Park, J. K. Jeong, Y. G. Mo, and H. D. Kim, Appl. Phys. Lett., 90, 212114 (2007). 10.1063/1.2742790 (Pubitemid 46828080)
-
(2007)
Applied Physics Letters
, vol.90
, Issue.21
, pp. 212114
-
-
Kim, M.1
Jeong, J.H.2
Lee, H.J.3
Ahn, T.K.4
Shin, H.S.5
Park, J.-S.6
Jeong, J.K.7
Mo, Y.-G.8
Kim, H.D.9
-
4
-
-
57049142035
-
-
10.1109/LED.2008.2006637
-
J. Y. Kwon, K. S. Son, J. S. Jung, T. S. Kim, M. K. Ryu, K. B. Park, B. W. Yoo, J. W. Kim, Y. G. Lee, K. C. Park, IEEE Electron Device Lett., 29, 1309 (2008). 10.1109/LED.2008.2006637
-
(2008)
IEEE Electron Device Lett.
, vol.29
, pp. 1309
-
-
Kwon, J.Y.1
Son, K.S.2
Jung, J.S.3
Kim, T.S.4
Ryu, M.K.5
Park, K.B.6
Yoo, B.W.7
Kim, J.W.8
Lee, Y.G.9
Park, K.C.10
-
5
-
-
34248399209
-
Amorphous gallium indium zinc oxide thin film transistors: Sensitive to oxygen molecules
-
DOI 10.1063/1.2723543
-
D. Kang, H. Lim, C. Kim, I. Song, J. Park, Y. Park, and J. G. Chung, Appl. Phys. Lett., 90, 192101 (2007). 10.1063/1.2723543 (Pubitemid 46738090)
-
(2007)
Applied Physics Letters
, vol.90
, Issue.19
, pp. 192101
-
-
Kang, D.1
Lim, H.2
Kim, C.3
Song, I.4
Park, J.5
Park, Y.6
Chung, J.7
-
6
-
-
39749191514
-
Electronic transport properties of amorphous indium-gallium-zinc oxide semiconductor upon exposure to water
-
DOI 10.1063/1.2838380
-
J. S. Park, J. K. Jeong, H. J. Chung, Y. G. Mo, and H. D. Kim, Appl. Phys. Lett., 92, 072104 (2008). 10.1063/1.2838380 (Pubitemid 351304848)
-
(2008)
Applied Physics Letters
, vol.92
, Issue.7
, pp. 072104
-
-
Park, J.-S.1
Jeong, J.K.2
Chung, H.-J.3
Mo, Y.-G.4
Kim, H.D.5
-
7
-
-
77949731627
-
-
10.1063/1.3357431
-
S. Y. Sung, J. H. Choi, U. B. Han, K. C. Lee, J. H. Lee, J. J. Kim, W. Lim, S. J. Pearton, D. P. Norton, and Y. W. Heo, Appl. Phys. Lett., 96, 102107 (2010) 10.1063/1.3357431
-
(2010)
Appl. Phys. Lett.
, vol.96
, pp. 102107
-
-
Sung, S.Y.1
Choi, J.H.2
Han, U.B.3
Lee, K.C.4
Lee, J.H.5
Kim, J.J.6
Lim, W.7
Pearton, S.J.8
Norton, D.P.9
Heo, Y.W.10
-
8
-
-
77956252679
-
-
10.1063/1.3432445
-
S. Yang, D. H. Cho, M. K. Ryu, S. H. K. Park, C. S. Hwang, J. Jang, and J. K. Jeong, Appl. Phys. Lett., 96, 213511 (2010). 10.1063/1.3432445
-
(2010)
Appl. Phys. Lett.
, vol.96
, pp. 213511
-
-
Yang, S.1
Cho, D.H.2
Ryu, M.K.3
Park, S.H.K.4
Hwang, C.S.5
Jang, J.6
Jeong, J.K.7
-
9
-
-
79951897759
-
-
10.1889/1.3499825
-
T. Arai, N. Morosawa, K. Tokunaga, Y. Terai, E. Fukumoto, T. Fujimori, T. Nakayama, T. Yamaguchi, and T. Sasaoka, SID-10 Digest, 41, 1033 (2010) 10.1889/1.3499825
-
(2010)
SID-10 Digest
, vol.41
, pp. 1033
-
-
Arai, T.1
Morosawa, N.2
Tokunaga, K.3
Terai, Y.4
Fukumoto, E.5
Fujimori, T.6
Nakayama, T.7
Yamaguchi, T.8
Sasaoka, T.9
-
10
-
-
75749140059
-
-
10.1109/LED.2009.2036944
-
S. Yang, D. H. Cho, M. K. Ryu, S. H. K. Park, C. S. Hwand, J. Jang, and J. K. Jeong, IEEE Electron Device Lett., 31, 144 (2010). 10.1109/LED.2009. 2036944
-
(2010)
IEEE Electron Device Lett.
, vol.31
, pp. 144
-
-
Yang, S.1
Cho, D.H.2
Ryu, M.K.3
Park, S.H.K.4
Hwand, C.S.5
Jang, J.6
Jeong, J.K.7
-
11
-
-
51849102800
-
-
10.1063/1.2962985
-
J. Park, S. Kim, C. Kim, S. Kim, I. Song, H. Yin, K.-K. Kim, S. Lee, K. Hong, J. Lee, Appl. Phys. Lett., 93, 053505 (2008). 10.1063/1.2962985
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 053505
-
-
Park, J.1
Kim, S.2
Kim, C.3
Kim, S.4
Song, I.5
Yin, H.6
Kim, K.-K.7
Lee, S.8
Hong, K.9
Lee, J.10
-
12
-
-
57049096959
-
-
10.1109/LED.2008.2007306
-
C. F. Huang, C. Y. Peng, Y. J. Yang, H C. Sun, H. C. Chang, P. S. Kuo, H. L. Chang, C. Z. Liu, and C. W. Liu, IEEE Electron Device Lett., 29, 1332 (2008). 10.1109/LED.2008.2007306
-
(2008)
IEEE Electron Device Lett.
, vol.29
, pp. 1332
-
-
Huang, C.F.1
Peng, C.Y.2
Yang, Y.J.3
Sun, H.C.4
Chang, H.C.5
Kuo, P.S.6
Chang, H.L.7
Liu, C.Z.8
Liu, C.W.9
-
13
-
-
33846070644
-
Investigating the stability of zinc oxide thin film transistors
-
DOI 10.1063/1.2425020
-
R. B. M. Cross and M. M. De Souza, Appl. Phys. Lett., 89, 263513 (2006). 10.1063/1.2425020 (Pubitemid 46058083)
-
(2006)
Applied Physics Letters
, vol.89
, Issue.26
, pp. 263513
-
-
Cross, R.B.M.1
De Souza, M.M.2
-
14
-
-
33846965196
-
-
10.1063/1.2458457
-
P. Gorrn, P. Holzer, T. Riedl, W. Kowalsky, J. Wang, T. Weimann, P. Hinze, and S. Kipp, Appl. Phys. Lett., 90, 063502 (2007). 10.1063/1.2458457
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 063502
-
-
Gorrn, P.1
Holzer, P.2
Riedl, T.3
Kowalsky, W.4
Wang, J.5
Weimann, T.6
Hinze, P.7
Kipp, S.8
-
15
-
-
38549145327
-
Bias stress stability of indium gallium zinc oxide channel based transparent thin film transistors
-
DOI 10.1063/1.2824758
-
A. Suresh and J. F. Muth, Appl. Phys. Lett., 92, 033502 (2008). 10.1063/1.2824758 (Pubitemid 351160654)
-
(2008)
Applied Physics Letters
, vol.92
, Issue.3
, pp. 033502
-
-
Suresh, A.1
Muth, J.F.2
-
16
-
-
52949097961
-
-
10.1063/1.2990657
-
J. K. Jeong, H. W. Yang, J. H. Jeong, Y. G. Mo, and H. D. Kim, Appl. Phys. Lett., 93, 123508 (2008). 10.1063/1.2990657
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 123508
-
-
Jeong, J.K.1
Yang, H.W.2
Jeong, J.H.3
Mo, Y.G.4
Kim, H.D.5
-
17
-
-
49249142162
-
-
10.1016/0039-6028(79)90411-4
-
N. Yamazoe, J. Fuchigami, M. Kishikawa, and T. Seiyama, Surf. Sci., 86, 335 (1979). 10.1016/0039-6028(79)90411-4
-
(1979)
Surf. Sci.
, vol.86
, pp. 335
-
-
Yamazoe, N.1
Fuchigami, J.2
Kishikawa, M.3
Seiyama, T.4
-
18
-
-
0024641396
-
-
10.1149/1.2096854
-
Y. Shimizu, M. Shimabukuro, H. Arai, and T. Seiyama, J. Electrochem. Soc., 136, 1206 (1989). 10.1149/1.2096854
-
(1989)
J. Electrochem. Soc.
, vol.136
, pp. 1206
-
-
Shimizu, Y.1
Shimabukuro, M.2
Arai, H.3
Seiyama, T.4
|