Silicon-on-insulator Bragg gratings fabricated by deep UV lithography

2010 Asia Communications and Photonics Conference and Exhibition, ACP 2010

Volumn , Issue , 2010, Pages 501-502

  Wang, Xu ^a   Shi, Wei ^a   Vafaei, Raha ^a   Jaeger, Nicolas A F ^a   Chrostowski, Lukas ^a  

^a UNIVERSITY OF BRITISH COLUMBIA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

DEEP-UV LITHOGRAPHY; EFFECTIVE INDEX OF REFRACTION; GRATING FABRICATION; SILICON ON INSULATOR; SILICON ON INSULATOR WAVEGUIDE; SINGLE-MASK; TUNABILITIES; ULTRA-VIOLET;

BRAGG GRATINGS; REFRACTIVE INDEX;

PHOTONICS;

EID: 79851483786     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ACP.2010.5682598     Document Type: Conference Paper

References (8)

1. T. E. Murphy, et. al., J. Lightwave Technol., vol. 19, no. 12, pp. 1938-1942 (2001)
2. S. Homampour, et. al., Phys. Status Solidi C, vol. 6, no. S1, pp. S240-S243 (2009)
3. J. T. Hastings, et. al., J. Vac. Sci. Technol. B, vol. 20, no. 6, pp. 2753-2757 (2002)
4. I. Giuntoni, et. al., Opt. Express, vol. 17, no. 21, pp. 18518-18524 (2009)
5. D. T. H. Tan, et. al., Opt. Lett., vol. 34, no. 9, pp. 1357-1359 (2009)
6. W. Bogaerts, et. al., J. Lightwave Technol., vol. 23, no. 1, pp. 401-412 (2005)
7. I. Giuntoni, et. al., IEEE Photon. Technol. Lett., vol. 21, no. 24, pp. 1894-1896 (2009)
8. A. B. Fallahkhair, et. al., J. Lightwave Technol., vol. 26, no. 11, pp. 1423-1431 (2008)