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Applied Physics A: Materials Science and Processing

Volumn 102, Issue 2, 2011, Pages 253-258

Measurement of object height in emission electron microscopy

(6) Schertz, F a Kutnyakhov, D a Schuppler, S b Nagel, P b Nepijko, S A a,c Schonhense G a

a JOHANNES GUTENBERG UNIVERSITY (Germany)

b KARLSRUHE INSTITUTE OF TECHNOLOGY (Germany)

c INSTITUTE OF HYDROBIOLOGY (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPES; EQUIPOTENTIAL SURFACES; FLAT SURFACES; IMAGE DISTORTIONS; MICROFIELDS; OPERATION MODE; QUANTITATIVE COMPARISON; TEST PATTERN;

CRYSTAL ATOMIC STRUCTURE; ELECTRIC POTENTIAL; ELECTRON EMISSION; ELECTRONS;

IMAGE PROCESSING;

EID: 79651471797 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-010-5998-0 Document Type: Article

Times cited : (2)

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