SCOPUS 정보 검색 플랫폼

Applied Physics A: Materials Science and Processing

Volumn 102, Issue 2, 2011, Pages 463-467

Fabrication of three-dimensional crystalline microstructures by selective ion implantation and chemical etching

(4) Wang, Tzyy Jiann a Tsou, Yueh Hsun a Chang, Wen Che a Niu, Huan b

a NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY (Taiwan)

b NATIONAL TSING HUA UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ETCHING; CRYSTALLINE STRUCTURE; CRYSTALLINE SUBSTRATES; ETCHING STOP; FABRICATION PROCESS; FABRICATION TECHNIQUE; MEASUREMENT RESULTS; MICRO-RAMAN SPECTRA; MICRODISKS; MICRORINGS; MICROWIRE; PARTIAL SURFACES; SUBSTRATE SURFACE; THREE-DIMENSIONAL (3D) MICROSTRUCTURES;

CRYSTALLINE MATERIALS; ETCHING; FABRICATION; MICROSTRUCTURE; RAMAN SPECTROSCOPY; SURFACE STRUCTURE; THREE DIMENSIONAL;

ION IMPLANTATION;

EID: 79651471012 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-010-6241-8 Document Type: Article

Times cited : (5)

References (18)

1
- 33644995873
- 10.1109/JLT.2005.863227 2006JLwT.24.1470P
- D. Pasquariello E.S. Björlin D. Lasaosa Y.-J. Chiu J. Piprek J.E. Bowers 2006 J. Lightwave Technol. 24 1470 10.1109/JLT.2005.863227 2006JLwT...24.1470P
- (2006) J. Lightwave Technol. , vol.24 , pp. 1470
- Pasquariello, D.¹ Björlin, E.S.² Lasaosa, D.³ Chiu, Y.-J.⁴ Piprek, J.⁵ Bowers, J.E.⁶

2
- 38149132322
- 10.1016/j.sna.2007.08.027
- R.D. White L. Chengb K. Grosh 2008 Sens. Actuators A, Phys. 141 288 10.1016/j.sna.2007.08.027
- (2008) Sens. Actuators A, Phys. , vol.141 , pp. 288
- White, R.D.¹ Chengb, L.² Grosh, K.³

3
- 0037396246
- 10.1109/TMTT.2003.809650 2003ITMTT.51.1247D
- L. Dussopt G.M. Rebeiz 2003 IEEE Trans. Microw. Theory Tech. 51 1247 10.1109/TMTT.2003.809650 2003ITMTT..51.1247D
- (2003) IEEE Trans. Microw. Theory Tech. , vol.51 , pp. 1247
- Dussopt, L.¹ Rebeiz, G.M.²

4
- 0042968717
- Optical microcavities
- DOI 10.1038/nature01939
- K.J. Vahala 2003 Nature 424 839 10.1038/nature01939 2003Natur.424..839V (Pubitemid 37021719)
- (2003) Nature , vol.424 , Issue.6950 , pp. 839-846
- Vahala, K.J.¹

5
- 0030085945
- 10.1049/ip-opt:19960133
- I.R. Johnston G.J. Parker 1996 IEE Proc., Optoelectron. 143 37 10.1049/ip-opt:19960133
- (1996) IEE Proc., Optoelectron. , vol.143 , pp. 37
- Johnston, I.R.¹ Parker, G.J.²

6
- 0025671518
- 10.1109/55.63048 1990IEDL.11.588E
- C.J.M. Eijkel J. Branebjerg M. Elwenspoek F.C.M. Van De Pol 1990 IEEE Electron Device Lett. 11 588 10.1109/55.63048 1990IEDL...11..588E
- (1990) IEEE Electron Device Lett. , vol.11 , pp. 588
- Eijkel, C.J.M.¹ Branebjerg, J.² Elwenspoek, M.³ Van De Pol, F.C.M.⁴

7
- 33745572395
- 3 thin film on silicon by laser irradiation and ion implantation-induced layer transfer
- DOI 10.1002/adma.200502364
- Y.-B. Park B. Min K.J. Vahala H.A. Atwater 2006 Adv. Mater. 18 1533 10.1002/adma.200502364 (Pubitemid 43979513)
- (2006) Advanced Materials , vol.18 , Issue.12 , pp. 1533-1536
- Park, Y.-B.¹ Min, B.² Vahala, K.J.³ Atwater, H.A.⁴

8
- 55449132541
- 10.1080/10408430802310868
- F. Chen 2008 Crit. Rev. Solid State Mater. Sci. 33 165 10.1080/10408430802310868
- (2008) Crit. Rev. Solid State Mater. Sci. , vol.33 , pp. 165
- Chen, F.¹

9
- 70350704576
- 10.1063/1.3216517 2009JAP.106h1101C
- F. Chen 2009 J. Appl. Phys. 106 081101 10.1063/1.3216517 2009JAP...106h1101C
- (2009) J. Appl. Phys. , vol.106 , pp. 081101
- Chen, F.¹

10
- 40549111581
- 10.1109/LPT.2007.892886 2007IPTL.19.417H
- H. Hu R. Ricken W. Sohler R.B. Wehrspohn 2007 IEEE Photonics Technol. Lett. 19 417 10.1109/LPT.2007.892886 2007IPTL...19..417H
- (2007) IEEE Photonics Technol. Lett. , vol.19 , pp. 417
- Hu, H.¹ Ricken, R.² Sohler, W.³ Wehrspohn, R.B.⁴

11
- 2142670684
- 10.1109/JLT.2004.825764 2004JLwT.22.887G
- D.M. Gill D. Jacobson C.A. White C.D.W. Jones Y. Shi W.J. Minford A. Harris 2004 J. Lightwave Technol. 22 887 10.1109/JLT.2004.825764 2004JLwT...22..887G
- (2004) J. Lightwave Technol. , vol.22 , pp. 887
- Gill, D.M.¹ Jacobson, D.² White, C.A.³ Jones, C.D.W.⁴ Shi, Y.⁵ Minford, W.J.⁶ Harris, A.⁷

12
- 77951475936
- 10.1109/JLT.2010.2045877 2010JLwT.28.1344W
- L. Wang J.-H. Zhao G. Fu 2010 J. Lightwave Technol. 28 1344 10.1109/JLT.2010.2045877 2010JLwT...28.1344W
- (2010) J. Lightwave Technol. , vol.28 , pp. 1344
- Wang, L.¹ Zhao, J.-H.² Fu, G.³

13
- 73949101934
- 10.1364/OE.17.024261 2009OExpr.1724261H
- H. Hu R. Ricken W. Sohler 2009 Opt. Express 17 24261 10.1364/OE.17.024261 2009OExpr..1724261H
- (2009) Opt. Express , vol.17 , pp. 24261
- Hu, H.¹ Ricken, R.² Sohler, W.³

14
- 39749175849
- Electro-optically tunable microring resonators on lithium niobate
- DOI 10.1364/OL.32.002777
- T.-J. Wang C.-H. Chu C.-Y. Lin 2007 Opt. Lett. 32 2777 10.1364/OL.32.002777 2007OptL...32.2777W (Pubitemid 351302875)
- (2007) Optics Letters , vol.32 , Issue.19 , pp. 2777-2779
- Wang, T.-J.¹ Chu, C.-H.² Lin, C.-Y.³

15
- 34247537560
- 10.1038/nphoton.2006.52 2007NaPho.1.61T
- A.C. Tamboli E.D. Haberer R. Sharma K.H. Lee S. Nakamura E.L. Hu 2007 Nat. Photonics 1 61 10.1038/nphoton.2006.52 2007NaPho...1...61T
- (2007) Nat. Photonics , vol.1 , pp. 61
- Tamboli, A.C.¹ Haberer, E.D.² Sharma, R.³ Lee, K.H.⁴ Nakamura, S.⁵ Hu, E.L.⁶

16
- 34247354449
- 10.1038/nphoton.2006.42 2007NaPho.1.65X
- F. Xia L. Sekaric Y. Vlasov 2007 Nat. Photonics 1 65 10.1038/nphoton. 2006.42 2007NaPho...1...65X
- (2007) Nat. Photonics , vol.1 , pp. 65
- Xia, F.¹ Sekaric, L.² Vlasov, Y.³

17
- 0036542554
- 10.1364/OL.27.000512 2002OptL.27.512K
- E. Krioukov D.J.W. Klunder A. Driessen J. Greve C. Otto 2002 Opt. Lett. 27 512 10.1364/OL.27.000512 2002OptL...27..512K
- (2002) Opt. Lett. , vol.27 , pp. 512
- Krioukov, E.¹ Klunder, D.J.W.² Driessen, A.³ Greve, J.⁴ Otto, C.⁵

18
- 33751500171
- 10.1021/cm00013a025
- J.-M. Jehng I.E. Wachs 1991 Chem. Mater. 3 100 10.1021/cm00013a025
- (1991) Chem. Mater. , vol.3 , pp. 100
- Jehng, J.-M.¹ Wachs, I.E.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.