Deformation and material removal in a nanoscale multi-layer thin film solar panel using nanoscratch

International Journal of Machine Tools and Manufacture

Volumn 51, Issue 3, 2011, Pages 182-189

  Sumitomo, Taro ^a   Huang, Han ^a   Zhou, Libo ^b  

^a UNIVERSITY OF QUEENSLAND   (Australia)

^b IBARAKI UNIVERSITY   (Japan)

Author keywords

Deformation; Material removal; Multi layer; Nanoscratch; Solar panel

Indexed keywords

AMORPHOUS SI; BRITTLE LAYERS; CRITICAL DEPTH; DEFORMATION STRUCTURE; DUCTILE REGIME; HARD AND BRITTLE MATERIALS; INDENTERS; MACHINING PROCESS; MATERIAL PROPERTY; MATERIAL REMOVAL; MULTI-LAYER THIN FILM; MULTILAYER STRUCTURES; NANO SCALE; NANO-SCRATCH; NANOMETRICS; NANOSCRATCHING; REMOVAL EFFICIENCIES; SOLAR PANELS;

AMORPHOUS FILMS; AMORPHOUS SILICON; ATOMIC FORCE MICROSCOPY; BRITTLE FRACTURE; CRYSTAL ATOMIC STRUCTURE; DEFORMATION; MACHINING; MATERIALS; MECHANICAL TESTING; NANOINDENTATION; SEMICONDUCTING SILICON COMPOUNDS; SOLAR CONCENTRATORS; STRIPPING (REMOVAL); THIN FILMS;

REMOVAL;

EID: 79551688739     PISSN: 08906955     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijmachtools.2010.11.012     Document Type: Article

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