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Volumn 102, Issue 1, 2011, Pages 169-172

Field-emission properties of patterned ZnO nanowires on 2.5D MEMS substrate

Author keywords

[No Author keywords available]

Indexed keywords

A-THERMAL; APPLIED VOLTAGES; ETCHING PROCESS; FABRICATION PROCESS; FIELD-EMISSION PATTERNS; FIELD-EMISSION PROPERTIES; MICRO HOLES; SEMI-CONDUCTOR FABRICATION; SI SUBSTRATES; ZNO NANOWIRES;

EID: 79551685270     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-010-5981-9     Document Type: Article
Times cited : (15)

References (17)
  • 8
    • 0141518628 scopus 로고    scopus 로고
    • Nanolithography using hierarchically assembled nanowire masks
    • DOI 10.1021/nl034268a
    • D. Whang S. Jin C.M. Lieber 2003 Nano Lett. 3 951 10.1021/nl034268a 2003NanoL...3..951W (Pubitemid 37161878)
    • (2003) Nano Letters , vol.3 , Issue.7 , pp. 951-954
    • Whang, D.1    Jin, S.2    Lieber, C.M.3
  • 9
    • 33646553878 scopus 로고    scopus 로고
    • Alignment of ZnO nanowires on Al, Ti, Pt electrodes
    • DOI 10.1016/j.matlet.2005.12.146, PII S0167577X06000176
    • J.H. Park W.J. Ko Y.J. Choi J.G. Park 2006 Mater. Lett. 60 2282 10.1016/j.matlet.2005.12.146 (Pubitemid 43728481)
    • (2006) Materials Letters , vol.60 , Issue.17-18 , pp. 2282-2287
    • Park, J.-H.1    Ko, W.-J.2    Choi, Y.-J.3    Park, J.-G.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.