Interfacial chemistry of poly(methyl methacrylate) arising from exposure to vacuum-ultraviolet light and atomic oxygen

Journal of Physical Chemistry A

Volumn 115, Issue 16, 2011, Pages 3736-3745

  Yuan, Hanqiu ^a   Killelea, Daniel R ^a   Tepavcevic, Sanja ^a,b   Kelber, Scott I ^a,c   Sibener, S J ^a  

^a UNIVERSITY OF CHICAGO   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC OXYGEN; FOURIER; GROUND ELECTRONIC STATE; HIGH ENERGY; IN-SITU; INFRARED REFLECTION ABSORPTION SPECTROSCOPY; INTERFACIAL CHEMISTRY; MASS LOSS RATE; MORPHOLOGICAL CHANGES; OXIDATIVE REACTION; PHYSICAL CHANGES; RATE OF MASS LOSS; SUPERSONIC BEAMS; SYNERGISTIC EFFECT; VACUUM ULTRAVIOLET RADIATION; VACUUM ULTRAVIOLETS; VUV IRRADIATION;

ATOMIC FORCE MICROSCOPY; ELECTRON ENERGY LOSS SPECTROSCOPY; ESTERS; IRRADIATION; OXYGEN; PHOTOCHEMICAL REACTIONS; POLYMER FILMS; QUARTZ; REACTION KINETICS; ULTRAVIOLET RADIATION; VACUUM;

ABSORPTION SPECTROSCOPY;

OXYGEN; POLY(METHYL METHACRYLATE);

ARTICLE; CHEMISTRY; KINETICS; OXIDATION REDUCTION REACTION; PHOTOCHEMISTRY; ULTRAVIOLET RADIATION; VACUUM;

KINETICS; OXIDATION-REDUCTION; OXYGEN; PHOTOCHEMISTRY; POLYMETHYL METHACRYLATE; ULTRAVIOLET RAYS; VACUUM;

EID: 79551634042     PISSN: 10895639     EISSN: 15205215     Source Type: Journal    
DOI: 10.1021/jp1061368     Document Type: Article

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