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Volumn 6, Issue SUPPL. 2, 2009, Pages
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Monolithically integrated UV/IR-photodetectors based on an AlN/GaN-based superlattice grown on an AlGaN buffer layer
b
CEA GRENOBLE
(France)
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Author keywords
[No Author keywords available]
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Indexed keywords
A-CENTER;
ACTIVE AREA;
ACTIVE REGIONS;
ALGAN;
ALN;
ALN BARRIERS;
CAP LAYERS;
EPITAXIAL STRUCTURE;
LONG WAVELENGTH;
MONOLITHICALLY INTEGRATED;
PHOTOCONDUCTIVE ULTRAVIOLET DETECTORS;
PLASMA-ASSISTED MOLECULAR BEAM EPITAXY;
QUANTUM WELL;
ROOM TEMPERATURE;
SAPPHIRE TEMPLATES;
STRAIN-COMPENSATED;
WAVELENGTH RANGES;
BUFFER LAYERS;
EPITAXIAL GROWTH;
GALLIUM NITRIDE;
INFRARED DETECTORS;
MONOLITHIC INTEGRATED CIRCUITS;
OPTOELECTRONIC DEVICES;
PHOTODETECTORS;
SEMICONDUCTING SILICON COMPOUNDS;
SUPERLATTICES;
THICK FILM DEVICES;
ULTRAVIOLET DETECTORS;
DETECTORS;
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EID: 79251630547
PISSN: 18626351
EISSN: 16101642
Source Type: Journal
DOI: 10.1002/pssc.200880761 Document Type: Article |
Times cited : (2)
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References (13)
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