Thin film bilayers of multiferroic bismuth ferrite on Pt-Si substrate

Physica Status Solidi - Rapid Research Letters

Volumn 5, Issue 2, 2011, Pages 83-85

  Wu, Jiagang ^a,b   Wang, John ^b   Xiao, Dingquan ^a   Zhu, Jianguo ^a  

^a SICHUAN UNIVERSITY   (China)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

BiFeO3; Impedance; Multiferroics; Quartz substrate; Thin films

Indexed keywords

BI-LAYER; BIFEO3; BISMUTH FERRITES; DIELECTRIC PERMITTIVITIES; ELECTRICAL BEHAVIORS; FATIGUE ENDURANCES; IMPEDANCE; MAGNETIC BEHAVIOR; MOBILE CHARGE; MULTIFERROICS; ORIENTATION GROWTH; PHASE PURITY; QUARTZ SUBSTRATE; RADIO FREQUENCY SPUTTERING; REMANENT POLARIZATION; SI SUBSTRATES; THIN FILM BILAYERS;

BISMUTH; CAPACITORS; FERRITES; PLATINUM; QUARTZ; SILICON COMPOUNDS; SPUTTERING; THIN FILMS;

SUBSTRATES;

EID: 79251581582     PISSN: 18626254     EISSN: 18626270     Source Type: Journal    
DOI: 10.1002/pssr.201004473     Document Type: Letter

References (16)

1. R. Ramesh et al., Nature Mater. 6, 21 (2007).
2. J. Wang et al., Science 299, 1719 (2003).
3. Y. H. Chu et al., Nature Mater. 7, 478 (2008).
4. X. D. Qi et al., Appl. Phys. Lett. 86, 062903 (2005).
5. J. G. Wu et al., Acta Mater. 58, 1688 (2010).
6. H. Béa et al., Phys. Rev. B. 74, 020101(R) (2006).
7. J. G. Wu et al., J. Appl. Phys. 107, 034103 (2010).
8. S. K. Singh et al., J. Appl. Phys. 102, 094109 (2007).
9. J. G. Wu et al., J. Appl. Phys. 106, 054115 (2009).
10. Y. W. Li et al., Appl. Phys. Lett. 87, 182902 (2005).
11. J. G. Wu et al., Appl. Phys. Lett. 94, 172906 (2009).
12. D. Xie et al., J. Appl. Phys. 105, 084109 (2009).
13. J. G. Wu et al., Appl. Phys. Lett. 95, 192901 (2009).
14. C. Ang et al., Phys. Rev. B 62, 228 (2000).
15. O. Auciello et al., Appl. Phys. Lett. 64, 2873 (1994).
16. M. Dawber et al., Appl. Phys. Lett. 76, 1060 (2000).