Vacancy defects in aluminum formed during aqueous dissolution

Electrochimica Acta

Volumn 56, Issue 4, 2011, Pages 1806-1809

  Hebert, K R ^a   Ai, J H ^a   Stafford, G R ^b   Ho, K M ^c,d   Wang, C Z ^c,d  

^a Iowa State University   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c IOWA STATE UNIVERSITY   (United States)

^d U S DEPARTMENT OF ENERGY   (United States)

Author keywords

Aluminum; Corrosion; Hydrogen absorption; Stress measurement; Vacancies

Indexed keywords

ABSORPTION MECHANISMS; AL THIN FILMS; ALUMINUM HYDRIDES; AQUEOUS DISSOLUTION; DEFECT FORMATION; ELECTROCHEMICAL POTENTIAL; HYDROGEN ABSORPTION; HYDROGEN CHEMICAL POTENTIALS; HYDROGEN DEFECTS; IN-SITU STRESS MEASUREMENT; MASS CHANGE; METAL SURFACES; NAOH SOLUTIONS; STRESS-THICKNESS; TIME DEPENDENCE; VACANCY DEFECTS;

ABSORPTION; ALUMINUM; CORROSION; DISSOLUTION; HYDROGEN; INSTRUMENTS; QUARTZ; STRESS MEASUREMENT; SURFACE CHEMISTRY; SURFACE DEFECTS;

VACANCIES;

EID: 79051471625     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2010.08.052     Document Type: Conference Paper

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