Thermal stability of HfO 2 nanotube arrays

Applied Surface Science

Volumn 257, Issue 9, 2011, Pages 4075-4081

  Qiu, Xiaofeng ^a   Howe, Jane Y ^a   Meyer III, Harry M ^a   Tuncer, Enis ^a   Paranthaman, M Parans ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

Anodic oxidation; Dielectric properties; Hafnium oxide; Nanotube arrays; Thermal stability

Indexed keywords

AMORPHOUS FILMS; ANNEALING; ANODIC OXIDATION; ATMOSPHERIC TEMPERATURE; DIELECTRIC PROPERTIES; ELECTROLYTES; FLUORINE COMPOUNDS; HAFNIUM OXIDES; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MORPHOLOGY; NANOTUBES; OXIDES; SCANNING ELECTRON MICROSCOPY; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; YARN;

CHEMICAL ENVIRONMENT; DIELECTRIC MEASUREMENTS; ELECTRO-CHEMICAL ANODIZATION; ELEVATED TEMPERATURE; NANOTUBE ARRAYS; POWDER X RAY DIFFRACTION; TRANSIENT CHARACTERISTIC; X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 78951490293     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.11.178     Document Type: Article

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