Comparison of MeV monomer ion and keV cluster ToF-SIMS

Surface and Interface Analysis

Volumn 43, Issue 1-2, 2011, Pages 249-252

  Jones, Brian N ^a   Matsuo, Jiro ^b,c   Nakata, Yoshihiko ^b   Yamada, Hideaki ^b   Watts, John ^a   Hinder, Steven ^a   Palitsin, Vladimir ^a   Webb, Roger ^a  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b KYOTO UNIVERSITY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

AP SIMS; MeV SIMS; PIXE; RBS

Indexed keywords

AP-SIMS; ELECTRONIC STOPPING; HIGH ENERGY; ION BEAM ANALYSIS; IONISATION; LATERAL RESOLUTION; MASS SPECTRA; MATRIX; MATRIX ASSISTED LASER DESORPTION; MEV IONS; MEV-SIMS; PARTICLE INDUCED X-RAY EMISSION; PIXE; PRIMARY IONS; QUANTITATIVE SURFACE ANALYSIS; RBS; RUTHERFORD BACK-SCATTERING; SECONDARY ION MASS SPECTROMETERS; SECONDARY ION YIELD; SECONDARY IONS; SUB-CELLULAR; SUBMICRON; SURFACE ANALYSIS TECHNIQUES; TANDEM ACCELERATORS; TIME OF FLIGHT; TOF SIMS;

BEAM PLASMA INTERACTIONS; BIOLOGICAL MATERIALS; DESORPTION; ION BEAMS; ION BOMBARDMENT; MASS SPECTROMETERS; MOLECULAR BIOLOGY; MONOMERS; PARTICLE ACCELERATORS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SPECTROMETRY; SURFACE ANALYSIS;

IONS;

EID: 78951482531     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3520     Document Type: Conference Paper

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