Patterns of surface immobilized block copolymer vesicle nanoreactors

European Polymer Journal

Volumn 47, Issue 2, 2011, Pages 130-138

  Chen, Qi ^a   Wilhelmina De Groot, G ^a   Schönherr, Holger ^a,b   Julius Vancso, G ^a,b  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b UNIVERSITY OF SIEGEN   (Germany)

Author keywords

Block copolymer vesicles; Enzyme and substrates; Micro molding in capillaries; Soft lithography

Indexed keywords

AQUEOUS MEDIUM; BLOCK COPOLYMER VESICLES; ELECTROSTATIC IMMOBILIZATION; ELECTROSTATIC INTERACTIONS; FLUOROGENIC SUBSTRATE; FUNCTIONALIZED; INFLUENCE OF PH; INTEGRATED MICROARRAYS; LAB-ON-A-CHIP; LINE PATTERN; MICRO REACTOR; MICROMOLDING; NANOCONTAINERS; POLYACRYLIC ACIDS; POTENTIAL APPLICATIONS; PROOF OF PRINCIPLES; REACTION VESSEL; REAL-TIME OBSERVATION; SILICON SURFACES; SOFT LITHOGRAPHY; SOLID SUPPORTS; SURFACE COVERAGES; TRIMETHOXYSILANE; ULTRA-SMALL;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; BLOCK COPOLYMERS; CAPILLARITY; ELECTROSTATICS; ENZYMES; FOURIER TRANSFORMS; IONIC STRENGTH; MOLDING; NANOREACTORS; ORGANIC ACIDS; POLYSTYRENES; REAL TIME SYSTEMS; SUBSTRATES;

COPOLYMERIZATION;

EID: 78751569920     PISSN: 00143057     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.eurpolymj.2010.11.005     Document Type: Article

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