Embedding quantum dot monolayers in Al2O3 using atomic layer deposition

Chemistry of Materials

Volumn 23, Issue 2, 2011, Pages 126-128

  Lambert, Karel ^a   Dendooven, Jolien ^a   Detavernier, Christophe ^a   Hens, Zeger ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

COATED PARTICLES; LANGMUIR-BLODGETT MONOLAYERS; MODEL SYSTEM; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; QUANTUM-DOT MONOLAYERS; THERMAL ALD;

ATOMIC LAYER DEPOSITION; CADMIUM COMPOUNDS; MONOLAYERS; OPTICAL PROPERTIES; PLASMA DEPOSITION; ZINC SULFIDE;

ALUMINUM;

EID: 78751502357     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm1027354     Document Type: Article

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