Quantum dot micropatterning on Si

Langmuir

Volumn 24, Issue 11, 2008, Pages 5961-5966

  Lambert, K ^a   Moreels, I ^a   Van Thourhout, D ^a   Hens, Z ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ATOMIC STRUCTURE; ELECTRON ENERGY LEVELS; ELECTRON MICROSCOPES; ELECTRON MICROSCOPY; ELECTRON OPTICS; IMAGING TECHNIQUES; LITHOGRAPHY; MICROMETERS; MICROSCOPES; MICROSCOPIC EXAMINATION; MONOLAYERS; OPTICAL WAVEGUIDES; PHOTORESISTS; QUANTUM ELECTRONICS; SCANNING; SCANNING ELECTRON MICROSCOPY; SCANNING PROBE MICROSCOPY; SILICON; SUBSTRATES; THICKNESS MEASUREMENT;

AMERICAN CHEMICAL SOCIETY (ACS); ATOMIC FORCE (AF); DIFFERENT TYPES; HIGH SELECTIVITY; HYBRID APPROACHES; LANGMUIR BLODGETT (LB) TECHNIQUES; LARGE AREAS; MICRO-PATTERNING; MICROMETER RESOLUTION; MONOLAYER STRUCTURES; PHOTORESIST REMOVAL; QUANTUM DOT (CO); QUANTUM-DOT MONOLAYERS; SILICON (111) SUBSTRATES; SPATIAL RESOLUTION (SR);

SEMICONDUCTOR QUANTUM DOTS;

EID: 45749156095     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la703664r     Document Type: Article

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