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Advanced Materials

Volumn 21, Issue 2, 2009, Pages 232-235

Atomic layer deposition of ZnO in quantum dot thin films

(3) Pourret, Alexandre a Guyot Sionnest, Philippe a Elam, Jeffrey W b

a UNIVERSITY OF CHICAGO (United States)

b ARGONNE NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; ATOMIC PHYSICS; CADMIUM COMPOUNDS; DEIONIZED WATER; ELECTRIC CURRENT MEASUREMENT; OPTICAL WAVEGUIDES; OXIDE FILMS; OXIDE MINERALS; QUANTUM ELECTRONICS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; SEMICONDUCTING LEAD COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; STAINLESS STEEL; THIN FILMS; TUBULAR STEEL STRUCTURES; ZINC; ZINC CASTINGS; ZINC OXIDE;

ALD SYSTEMS; ATOMIC LAYERS; IN-SITU; LAYER DEPOSITION; NANOCRYSTAL (NC) FILMS; PHOTOLUMINESCENCE (PL) MEASUREMENTS; QUANTUM DOT (CO); QUARTZ CRYSTALS; STEEL TUBES;

SEMICONDUCTOR QUANTUM DOTS;

EID: 58449114200 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/adma.200801313 Document Type: Article

Times cited : (89)

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