Double-gyroid morphology of a polystyrene-block- poly(ferrocenylethylmethylsilane) diblock copolymer: A route to ordered bicontinuous nanoscale architectures

Macromolecular Chemistry and Physics

Volumn 212, Issue 2, 2011, Pages 198-201

  Gwyther, Jessica ^a   Lotze, Gudrun ^b   Hamley, Ian ^b   Manners, Ian ^a  

^a UNIVERSITY OF BRISTOL   (United Kingdom)

^b UNIVERSITY OF READING   (United Kingdom)

Author keywords

anionic polymerization; block copolymers; lithography; self assembly

Indexed keywords

BICONTINUOUS; DIBLOCK COPOLYMER; MAIN CHAINS; NANOSCALE ARCHITECTURES; PLASMA ETCH; POLYMERISATION; SELF-ASSEMBLED; SPACE GROUPS; TEM;

BLOCK COPOLYMERS; COPOLYMERIZATION; MORPHOLOGY; PLASTIC PRODUCTS; POLYMERS; POLYSTYRENES; SELF ASSEMBLY;

ANIONIC POLYMERIZATION;

EID: 78651414322     PISSN: 10221352     EISSN: 15213935     Source Type: Journal    
DOI: 10.1002/macp.201000496     Document Type: Article

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