Synthesis of amorphous carbon nanowalls by DC-PECVD on different substrates and study of its field emission properties

Applied Surface Science

Volumn 257, Issue 8, 2011, Pages 3717-3722

  Banerjee, D ^a   Mukherjee, S ^a   Chattopadhyay, K K ^a  

^a JADAVPUR UNIVERSITY   (India)

Author keywords

Carbon nanowall; FESEM; Field emission; PECVD

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; AMORPHOUS SILICON; ATOMIC FORCE MICROSCOPY; CARBON FILMS; FIELD EMISSION; FILM PREPARATION; MORPHOLOGY; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

AMORPHOUS CARBON THIN FILMS; CARBON NANOWALLS; DEPOSITION TEMPERATURES; DIRECT CURRENT PLASMAS; FESEM; FIELD ELECTRON EMISSIONS; FIELD EMISSION PROPERTY; FIELD EMISSION SCANNING ELECTRON MICROSCOPES;

ELECTRON EMISSION;

EID: 78651367372     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.11.119     Document Type: Article

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