Fabrication of carbon nanoflakes by RF sputtering for field emission applications

Vacuum

Volumn 84, Issue 12, 2010, Pages 1452-1456

  Shih, Wen Ching ^a   Jeng, Jian Min ^a   Huang, Chin Tze ^a   Lo, Jyi Tsong ^b  

^a TATUNG UNIVERSITY   (Taiwan)

^b Tatung Company   (Taiwan)

Author keywords

Carbon nanoflake; Field emission; Sputtering

Indexed keywords

DEPOSITION; FLOW OF GASES; SPUTTERING;

CARBON NANOSTRUCTURES; DEPOSITION PARAMETERS; ELECTRON FIELD EMISSION; FIELD EMISSION APPLICATION; FIELD EMISSION PROPERTY; SUBSTRATE PRE-TREATMENTS; SUBSTRATE TEMPERATURE; SYNTHESIS TEMPERATURES;

FIELD EMISSION;

EID: 77956445344     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.01.049     Document Type: Conference Paper

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