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Volumn 509, Issue 5, 2011, Pages 1774-1776

Effects of oxygen addition on physical properties of ZnO thin film grown by radio frequency reactive magnetron sputtering

(6) Hsu, Che Wei a Cheng, Tsung Chieh b Yang, Chun Hui c Shen, Yi Ling c Wu, Jong Shinn a Wu, Sheng Yao b

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

b NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES (Taiwan)

c NATIONAL NANO DEVICE LABORATORIES (Taiwan)

Author keywords

Radio frequency; Sputtering; Target poisoning; X ray diffraction; X ray photoelectron spectroscopy; Zinc oxide

Indexed keywords

ARGON ION DENSITY; GLASS SUBSTRATES; GRAIN SIZE; OXYGEN ADDITION; POLYCRYSTALLINITY; RADIO FREQUENCIES; RADIO FREQUENCY REACTIVE MAGNETRON SPUTTERING; RF REACTIVE MAGNETRON SPUTTERING; ROOM TEMPERATURE; XPS ANALYSIS; ZNO THIN FILM;

ARGON; BINDING ENERGY; DIFFRACTION; METALLIC FILMS; OPTICAL FILMS; OXYGEN; PHOTOELECTRICITY; PHOTONS; PLASMA DENSITY; RADIO; RADIO WAVES; STOICHIOMETRY; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAYS; ZINC; ZINC OXIDE;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 78651355106 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2010.10.037 Document Type: Article

Times cited : (62)

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