Influence of stress on the structural and dielectric properties of rf magnetron sputtered zinc oxide thin film

Journal of Applied Physics

Volumn 103, Issue 9, 2008, Pages

  Menon, Rashmi ^a   Sreenivas, K ^a   Gupta, Vinay ^a  

^a UNIVERSITY OF DELHI   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; GROWTH KINETICS; MAGNETRON SPUTTERING; OXIDE FILMS; PERMITTIVITY; STRESS MEASUREMENT; ZINC OXIDE;

GLASS SUBSTRATE; OXYGEN PERCENTAGE; REACTIVE GAS MIXTURES; SPUTTERING PRESSURE;

THIN FILMS;

EID: 43949127404     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2903531     Document Type: Article

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