Ru incorporation on marked enhancement of diffusion resistance of multi-component alloy barrier layers

Journal of Alloys and Compounds

Volumn 509, Issue 5, 2011, Pages

  Chang, Shou Yi ^a   Wang, Chen Yuan ^a   Chen, Ming Ku ^a   Li, Chen En ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

Diffusion barrier; High entropy alloy; Interconnect

Indexed keywords

ALUMINUM ALLOYS; AMORPHOUS FILMS; CHROMIUM ALLOYS; COPPER; DIFFUSION BARRIERS; SILICIDES; TANTALUM ALLOYS; TITANIUM ALLOYS; ZIRCONIUM ALLOYS;

DIFFUSION BARRIER LAYERS; DIFFUSION RESISTANCE; HIGH ENTROPY ALLOYS; INTERCONNECT; INTERCONNECT STRUCTURES; LATTICE DISTORTIONS; MULTI-COMPONENT ALLOY; RU INCORPORATIONS;

RUTHENIUM ALLOYS;

EID: 78651350629     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2010.11.124     Document Type: Letter

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