Controlled growth of monodisperse nanocrystallites in tin(IV) oxide nanofilms

Crystal Growth and Design

Volumn 11, Issue 1, 2011, Pages 247-255

  Bazargan, Samad ^a   Heinig, Nina F ^a   Pradhan, Debabrata ^a   Leung, K T ^a  

^a UNIVERSITY OF WATERLOO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEAL TEMPERATURES; AVERAGE SIZE; CONCOMITANT GROWTH; CONTROLLED GROWTH; DEPTH DISTRIBUTION; ENERGY DISPERSIVE X-RAY; FABRICATION METHOD; GAS SENSING; GRANULAR FILM; GRANULAR STRUCTURESS; GROWTH MECHANISMS; MONODISPERSE; NANO FILMS; NANOCRYSTALLINE FILMS; NANOCRYSTALLITE SIZE; NANOELECTRONIC APPLICATIONS; NARROW SIZE DISTRIBUTIONS; PHYSICAL CONTROL; RAMAN EXPERIMENTS; SILICON SUBSTRATES; SPIN-COATING METHOD; TIN CHLORIDES; X-RAY DIFFRACTION STUDIES; X-RAY PHOTOEMISSIONS;

AMORPHOUS FILMS; CHLORINE COMPOUNDS; DEPTH PROFILING; DIFFRACTION; FILM GROWTH; GRAIN GROWTH; NANOCRYSTALLINE SILICON; OXIDE FILMS; OXYGEN; SPIN GLASS; TIN; TIN OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAYS;

NANOCRYSTALLITES;

EID: 78651094739     PISSN: 15287483     EISSN: 15287505     Source Type: Journal    
DOI: 10.1021/cg1011814     Document Type: Article

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