Field emission of aluminum nitride nanocones deposited on titanium substrate

Advanced Materials Research

Volumn 129-131, Issue , 2010, Pages 476-481

  Hu, Yemin ^a   Hu, Zheng ^b   Zhang, Fan ^b   Li, Ying ^a   Zhu, Mingyuan ^a   Wang, Shiwei ^a  

^a SHANGHAI UNIVERSITY   (China)

^b NANJING UNIVERSITY   (China)

Author keywords

Aluminum nitride; Field emission; Nanocone; Titanium substrate

Indexed keywords

FIELD EMISSION MEASUREMENTS; NANO-CONES; NANOCONE; NITRIDING TREATMENT; TITANIUM SUBSTRATE; TITANIUM SUBSTRATES; TURN-ON FIELD;

ALUMINUM; ALUMINUM NITRIDE; CHEMICAL VAPOR DEPOSITION; FIELD EMISSION; MANUFACTURE; NITRIDING; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SUBSTRATES; TITANIUM; TITANIUM NITRIDE;

ALUMINUM COATINGS;

EID: 78650750639     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/AMR.129-131.476     Document Type: Conference Paper

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