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Volumn 85, Issue 6, 2011, Pages 701-704
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HFCVD diamond deposition parameters optimized by a Taguchi Matrix
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Author keywords
CVD diamond; HFCVD; Taguchi Matrix
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Indexed keywords
CVD DIAMOND;
DEPOSITION CONDITIONS;
DIAMOND QUALITY;
EXPERIMENTAL DESIGN;
FIGURE OF MERIT;
FILM PROPERTIES;
GAS COMPOSITIONS;
GAS FLOWS;
GRAIN SIZE;
HFCVD;
HFCVD DIAMOND;
MASS FLOW;
MATRIX;
METHANE CONTENT;
ORTHOGONAL ARRAY;
STRUCTURAL QUALITIES;
SUBSTRATE TEMPERATURE;
TAGUCHI;
TOTAL GAS PRESSURE;
TOTAL MASS;
TOTAL PRESSURE;
DIAMOND DEPOSITS;
DIAMONDS;
FILM GROWTH;
GRAIN GROWTH;
GRAIN SIZE AND SHAPE;
MASS TRANSFER;
METHANATION;
METHANE;
PRESSURE EFFECTS;
RESIDUAL STRESSES;
STRUCTURAL DESIGN;
WALLS (STRUCTURAL PARTITIONS);
CHEMICAL VAPOR DEPOSITION;
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EID: 78650717376
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.vacuum.2010.10.010 Document Type: Article |
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Times cited : (38)
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References (17)
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