In situ synthesis of Si3N4 in the Na2SiF6-N2 system via CVD: Kinetics and mechanism of solid-precursor decomposition

Solid State Ionics

Volumn 177, Issue 39-40, 2007, Pages 3529-3536

  Leal Cruz, A L ^a   Pech Canul, M I ^a  

^a DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

CVD Si3N4; Kinetics; Reaction mechanisms; Silicon precursor; Sodium silicofluoride

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; NUMERICAL METHODS; REACTION KINETICS; SYNTHESIS (CHEMICAL);

SILICON PRECURSOR; SODIUM SILICOFLUORIDE;

SILICON COMPOUNDS;

EID: 33845668400     PISSN: 01672738     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssi.2006.09.016     Document Type: Article

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