Substrate-independent dip-pen nanolithography based on reactive coatings

Journal of the American Chemical Society

Volumn 132, Issue 51, 2010, Pages 18023-18025

  Chen, Hsien Yeh ^a,c   Hirtz, Michael ^a   Deng, Xiaopei ^d   Laue, Thomas ^a   Fuchs, Harald ^a,b   Lahann, Joerg ^a,d  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b UNIVERSITY OF MÜNSTER   (Germany)

^c NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^d UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIOTECHNOLOGICAL APPLICATIONS; CLICK CHEMISTRY; DIFFERENT SUBSTRATES; DIP-PEN NANOLITHOGRAPHY; NANO-STRUCTURING; PATTERN QUALITY; PRINTING TECHNOLOGIES; REACTIVE COATING; SURFACE MODIFICATION;

COATINGS; FUNCTIONAL GROUPS; NANOLITHOGRAPHY; POLYSTYRENES; STAINLESS STEEL;

SUBSTRATES;

POLY(4 ETHYNYL 4 XYLYLENE CO 4 XYLYLENE); POLYMER; UNCLASSIFIED DRUG;

ARTICLE; CONTROLLED STUDY; DIP PEN NANOLITHOGRAPHY; NANOIMAGING; NANOTECHNOLOGY; PRINTING; QUALITY CONTROL; SCANNING ELECTRON MICROSCOPY;

CLICK CHEMISTRY; NANOTECHNOLOGY; PRINTING; SURFACE PROPERTIES; VOLATILIZATION; XYLENES;

EID: 78650628104     PISSN: 00027863     EISSN: 15205126     Source Type: Journal    
DOI: 10.1021/ja108679m     Document Type: Article

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