A maskless exposure device for rapid photolithographic prototyping of sensor and microstructure layouts

Procedia Engineering

Volumn 5, Issue , 2010, Pages 331-334

  Rajan, Dhanesh Kattipparambil ^a   Lekkala, Jukka ^a  

^a TAMPERE UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

Lithography; Maskless lithography; Microfabrication; Rapid prototyping

Indexed keywords

COST EFFECTIVENESS; MICROFABRICATION; RAPID PROTOTYPING;

COMPUTER SCREENS; COST EFFECTIVE; DIGITAL LIGHT PROCESSING; ELECTRODE STRUCTURE; FAST PROTOTYPING; MASK-LESS LITHOGRAPHY; MINIMUM COST; SUBSTRATE SURFACE;

LITHOGRAPHY;

EID: 78650627026     PISSN: None     EISSN: 18777058     Source Type: Conference Proceeding    
DOI: 10.1016/j.proeng.2010.09.115     Document Type: Conference Paper

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