Fabrication of black silicon materials by wet etching and characterization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7658, Issue , 2010, Pages

  Guo, Zhengyu ^a   Wu, Zhiming ^a   Zhang, Anyuan ^a   Jiang, Jing ^a   Zhao, Guodong ^a   Jiang, Yadong ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

Black silicon; Si3N4 mask; Wet etching

Indexed keywords

ABSORPTANCE; AT-WAVELENGTH; BLACK SILICON; ECONOMICAL METHODS; FEMTO-SECOND LASER; HYDROTHERMAL ETCHING; SI3N4 MASK; VISIBLE AND NEAR INFRARED; WET ETCHING TECHNIQUES;

DISPLAY DEVICES; ENERGY CONVERSION; FABRICATION; MATERIALS TESTING; OPTOELECTRONIC DEVICES; SILICON; TECHNOLOGY; TESTING;

WET ETCHING;

EID: 78650451389     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.865825     Document Type: Conference Paper

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