Properties and Microelectronic Applications of Thin Films of Refractory Metal Nitrides

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 3, Issue 4, 1985, Pages 1797-1803

  Wittmer, Marc ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 78650224871     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.573382     Document Type: Article

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