Study of rapid grain boundary migration in a nanocrystalline Ni thin film

Materials Science and Engineering: A

Volumn 528, Issue 3, 2011, Pages 1628-1635

  Kacher, Josh ^a   Robertson, I M ^a   Nowell, Matt ^b   Knapp, J ^c   Hattar, Khalid ^c  

^a University of Illinois at Urbana Champaign   (United States)

^b EDAX TSL   (United States)

^c SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Abnormal grain growth; Annealing; Electron microscopy; Pulsed laser deposited Ni

Indexed keywords

ANNEALING; ELECTRONS; FILM GROWTH; GRAIN BOUNDARIES; GRAIN GROWTH; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NANOCRYSTALS; PULSED LASER DEPOSITION;

ABNORMAL GRAIN GROWTH; ANNEALING; ANNEALING PROCESS; GRAIN BOUNDARY MIGRATIONS; GRAIN GROWTH RATES; GRAIN-BOUNDARIES; NANOCRYSTALLINE NI; NI THIN FILMS; PULSED LASER DEPOSITED NI; REAL- TIME;

PULSED LASERS;

EID: 78650173835     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msea.2010.10.109     Document Type: Article

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