Highly conformal SiO2/Al2O3 nanolaminate gas-diffusion barriers for large-area flexible electronics applications

Nanotechnology

Volumn 21, Issue 47, 2010, Pages

  Choi, Jin Hwan ^a   Kim, Young Min ^a   Park, Young Wook ^a   Park, Tae Hyun ^a   Jeong, Jin Wook ^a   Choi, Hyun Ju ^a   Song, Eun Ho ^a   Lee, Jin Woo ^b   Kim, Cheol Ho ^b   Ju, Byeong Kwon ^a  

^a Korea University   (South Korea)

^b Cheil Industries Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BARRIER PERFORMANCE; BI-LAYER; CALCIUM SENSORS; CONFORMAL COATINGS; DEGRADATION TEST; ELECTRONICS APPLICATIONS; GAS DIFFUSION; INORGANIC LAYERS; LAMINATE FILMS; MOISTURE PERMEATION; NANOLAMINATE; NANOSCALE THICKNESS; OHMIC BEHAVIOR; ORGANIC ELECTRONICS; PERMEATION RATE; PLASTIC SUBSTRATES; POLYETHERSULFONES; RELATIVE HUMIDITIES; RF-MAGNETRON SPUTTERING; RF-SPUTTERING; ROOM TEMPERATURE; UV RESINS; VOID DEFECTS;

ALUMINUM; ATMOSPHERIC HUMIDITY; CALCIUM; DIFFUSION BARRIERS; FILM GROWTH; FLEXIBLE ELECTRONICS; PLASTIC COATINGS; RESINS; SILICON COMPOUNDS; SUBSTRATES;

GAS PERMEABLE MEMBRANES;

EID: 78650136394     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/47/475203     Document Type: Article

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