Optical mapping of large area thin film solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2010, Pages 1678-1683

  Huang, Zhiquan ^a   Chen, Jie ^a   Sestak, Michelle N ^a   Attygalle, Dinesh ^a   Dahal, Lila Raj ^a   Mapes, Meghan R ^a   Strickle, David A ^b   Kormanyos, Kenneth R ^c   Salupo, Carl ^d   Collins, R W ^d  

^a UNIVERSITY OF TOLEDO   (United States)

^b Pilkington North America Inc   (United States)

^c Calyxo USA Inc   (United States)

^d NONE

Author keywords

[No Author keywords available]

Indexed keywords

A-SI:H; BAND GAPS; CDS; CDTE; DEPOSITION PROCESS; GRAIN STRUCTURES; HYDROGENATED AMORPHOUS SILICON (A-SI:H); I-LAYER; MAPPING CAPABILITIES; MULTI-CHANNEL; OPTICAL MAPPING; ROUGHNESS LAYERS; SCALE-UP; THIN FILM PHOTOVOLTAICS; THIN FILM SOLAR CELLS; TRANSPARENT CONDUCTING OXIDE; WINDOW LAYER;

AMORPHOUS FILMS; CADMIUM ALLOYS; CADMIUM COMPOUNDS; CADMIUM SULFIDE; DEPOSITION; MAPPING; PHOTOVOLTAIC EFFECTS; SEMICONDUCTING SILICON COMPOUNDS; SURFACE ROUGHNESS; THIN FILMS; VAPOR DEPOSITION;

AMORPHOUS SILICON;

EID: 78650079050     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2010.5616069     Document Type: Conference Paper

References (9)

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2. G. E. Jellison, Jr., "Data analysis for spectroscopic ellipsometry", in: Handbook of Ellipsometry, edited by H. G. Tompkins and E. A. Irene, (William Andrew, Norwich, NY, 2005) pp. 237-296.
3. R. W. Collins and A. S. Ferlauto, "Optical physics of materials", in: Handbook of Ellipsometry, edited by H. G. Tompkins and E. A. Irene, (William Andrew, Norwich, NY, 2005) pp. 93-236.
4. A Luque and S. Hegedus (Editors), Handbook of Photo voltaic Science and Engineering, (Wiley, New York, 2003.
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6. J. Lee, P. I. Rovira, I. An, and R W. Collins, "Rotating compensator multichannel ellipsometry: applications for real time Stokes vector spectroscopy of thin film growth", Rev. Sci. Instrum. 69, 1800-1810 (1998).
7. B. Johs, J. Hale, N. J. lanno, C. M. Herzinger, T. Tiwald, and J. A. Woollam, "Recent developments in spectroscopic ellipsometry for in situ applications", in Optical Metrology Roadmap For The Semiconductor, Optical, And Data Storage Industries II, edited by A. Duparre and B. Singh, (SPIE, Bellingham WA, 2001) vol. 4449, pp. 41-57.
8. A. S. Ferlauto, G. M. Ferreira, J. M. Pearce, C. R Wronski, R W. Collins, X. M. Deng, and G. Ganguly, "Analytical model for the optical functions of amorphous semiconductors from the near-infrared to ultraviolet: applications in thin film photovoltaics", J. Appl. Phys. 92, 2424-2436 (2002).
9. R.W. Collins and B.Y. Yang, "In situ ellipsometry of thin film deposition: implications for amorphous and microcrystalline Si growth", J. Vac. Sci. Technol. B 7, 1155-1164 (1989).