Electron beam lithography time dependent dose correction for reticle CD uniformity enhancement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 I, Issue , 2006, Pages

  Wilcox, Nathan ^a   Vernon, Matt ^a   Jamieson, Andrew ^a  

^a INTEL CORPORATION   (United States)

Author keywords

CD uniformity; Electron beam resist; Electron proximity effect correction; Post exposure delay; Vacuum stability

Indexed keywords

CD UNIFORMITY; ELECTRON BEAM RESIST; ELECTRON PROXIMITY EFFECT CORRECTION; POST EXPOSURE DELAY; VACUUM STABILITY;

ELECTRON BEAM LITHOGRAPHY; ERROR COMPENSATION; OPTICAL DEVICES; PATTERN RECOGNITION;

DOSIMETRY;

EID: 33748091381     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681734     Document Type: Conference Paper

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