Nissin 300mm medium current ion implanter EXCEED2300

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 2000, Pages 415-418

  Nagai, Nobuo ^a   Tamura, Yoshio ^a   Yuasa, Satoru ^a   Iwasawa, Koji ^a   Matsumoto, Takao ^a   Nakaya, Makoto ^a   Nakamura, Mitsunori ^a   Nagayama, Tsutomu ^a  

^a NISSIN ION EQUIPMENT CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ION IMPLANTERS; MASS PRODUCTION; PRODUCTIVITY ENHANCEMENT; ULSI MANUFACTURING;

ION IMPLANTATION;

EID: 78649818526     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/.2000.924176     Document Type: Conference Paper

References (11)

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3. J.C. Olson, A. Renau and J. Buff, "Scanned Beam Uniformity Control in the VIISta 810 Ion Implanter," 1998 Int'l Conf. on Ion Implantation Tech. Proceedings, pp. 169-172,1999. (Pubitemid 30520183)
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7. T. Kubo, T. Hisaeda, T. Miyake, T. Ishigami, M. Kase, K. Watanabe and T. Fukuda, "Energy contamination from multiple-charged ion implantation in conventional implanter," Proceedings of the Eleventh Int 7 Conf. On Ion Implantation Tech, pp. 100-103,1997.
8. A. Renau and D. Hacker, "The VIISta 810 300mm Medium Current Ion Implanter, " 1998Int'l Conf. on Ion Implantation Tech. Proceedings, pp. 158-161, 1999.
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