Overview of the Eaton 8250 medium current implanter

Proceedings of the International Conference on Ion Implantation Technology

Volumn 1, Issue , 1999, Pages 266-269

  Harlan, John M ^a   Petry, Klaus ^a  

^a EATON CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DOSIMETRY; ELECTRIC CURRENTS; ELECTROSTATIC LENSES; ION BEAMS; ION SOURCES; MAGNETS; STATISTICAL PROCESS CONTROL;

MEDIUM CURRENT ION IMPLANTERS;

ION IMPLANTATION;

EID: 0033356885     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)