Scanned beam uniformity control in the VIISta 810 ion implanter

Proceedings of the International Conference on Ion Implantation Technology

Volumn 1, Issue , 1999, Pages 169-172

  Olson, J C ^a   Renau, A ^a   Buff, J ^a  

^a VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ELECTROSTATICS; ION BEAMS; MAGNETIC LENSES;

ION IMPLANTERS;

ION IMPLANTATION;

EID: 0033348487     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)