Productivity brush-up of the Nissin EXCEED2000 medium current implanter

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 1996, Pages 462-465

  Nagai, N ^a   Naito, M ^a   Matsumoto, T ^a   Nishikawa, K ^a   Iwasawa, K ^a   Nishigami, Y ^a   Senoh, K ^a   Nakaya, M ^a   Saitoh, Y ^a   Hosono, M ^a   Tanaka, Y ^a   Satoh, S ^a   Nakamura, M ^a   Kawai, T ^a  

^a NISSIN ELECTRIC CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHUCKS; CONTROLLABILITY; DOSIMETRY; FACTORY AUTOMATION; ION BEAMS; ION SOURCES; PRODUCTIVITY; SECONDARY ION MASS SPECTROMETRY;

MEDIUM CURRENT IMPLANTERS;

ION IMPLANTATION;

EID: 0030348767     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)