Core ion implanter for 300-mm wafers: IW-630

Proceedings of the International Conference on Ion Implantation Technology

Volumn 1, Issue , 1999, Pages 150-153

  Nishihashi, T ^a   Yokoo, H ^a   Hisamune, T ^a   Sakuishi, T ^a   Kimura, N ^a   Niikura, K ^a   Ishiwatari, S ^a   Fukui, R ^a   Tomita, M ^a   Shimizu, T ^a   Miyaya, T ^a   Iwase, Y ^a   Kunibe, T ^a   Ogata, S ^a   Fuwa, K ^a  

^a ULVAC INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTOR DOPING; SUBSTRATES;

CORE ION IMPLANTERS;

ION IMPLANTATION;

EID: 0033319118     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)